Open AccessChemical vapor deposition of low-dielectric constant organosilicon-based thin films
Author(s) -
Nariné Razmik Malkhasyan
Publication year - 2009
Language(s) - English
Resource type - Dissertations/theses
DOI - 10.17760/d10019224
Subject(s) - organosilicon , passivation , materials science , dielectric , coating , chemical vapor deposition , thin film , porosity , composite material , atomic layer deposition , chemical engineering , nanotechnology , optoelectronics , layer (electronics) , polymer chemistry , engineering
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