Ion Implantation and Annealing of SrTiO3 and CaTiO3
Author(s) -
C. W. White,
L. A. Boatner,
J. Rankin,
Michael J. Aziz
Publication year - 1987
Publication title -
mrs proceedings
Language(s) - English
Resource type - Journals
eISSN - 1946-4274
pISSN - 0272-9172
DOI - 10.1557/proc-93-9
Subject(s) - materials science , annealing (glass) , epitaxy , amorphous solid , recrystallization (geology) , ion implantation , ion , crystallography , analytical chemistry (journal) , nanotechnology , metallurgy , chemistry , paleontology , organic chemistry , layer (electronics) , chromatography , biology
Ion implantation damage and thermal annealing results are presented for single crystals of SrTiO3 and CaTiO3. The near-surface region of both of these materials can be made amorphous by low doses (approx.10 V/cmS) of heavy ions (Pb at 540 keV). During annealing, the amorphous implanted region crystallizes epitaxially on the underlying single-crystal substrate. The kinetics of this solid-phase epitaxial recrystallization process have been measured by employing ion channeling techniques.
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