Open AccessGas-Phase Silicon Atom Densities in the Chemical Vapor Deposition of Silicon from Silane
Author(s) -
Michael E. Coltrin,
W.G. Breiland,
Pauline Ho
Publication year - 1993
Publication title -
mrs proceedings
Language(s) - English
Resource type - Journals
eISSN - 1946-4274
pISSN - 0272-9172
DOI - 10.1557/proc-334-3
Subject(s) - silane , materials science , silicon , chemical vapor deposition , vapour density , hydrogen , radius , analytical chemistry (journal) , atom (system on chip) , deposition (geology) , decomposition , partial pressure , hydrogen atom , atomic physics , vapor pressure , oxygen , chemistry , nanotechnology , organic chemistry , paleontology , alkyl , computer security , physics , sediment , computer science , biology , embedded system , metallurgy , composite material
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom