Multiscale 3D characterization with dark-field x-ray microscopy
Author(s) -
Hugh Simons,
Anders C. Jakobsen,
Sonja Rosenlund Ahl,
C. Detlefs,
Henning Friis Poulsen
Publication year - 2016
Publication title -
mrs bulletin
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.19
H-Index - 153
eISSN - 1938-1425
pISSN - 0883-7694
DOI - 10.1557/mrs.2016.114
Subject(s) - dark field microscopy , characterization (materials science) , microscopy , x ray , materials science , field (mathematics) , nanotechnology , optics , physics , mathematics , pure mathematics
Dark-field x-ray microscopy is a new way to three-dimensionally map lattice strain and orientation in crystalline matter. It is analogous to dark-field electron microscopy in that an objective lens magnifies diffracting features of the sample; however, the use of high-energy synchrotron x-rays means that these features can be large, deeply embedded, and fully mapped in seconds to minutes. Simple reconfiguration of the x-ray objective lens allows intuitive zooming between different scales down to a spatial and angular resolution of 100 nm and 0.001°, respectively. Three applications of the technique are presented—mapping the evolution of subgrains during the processing of plastically deformed aluminum, mapping domains and strain fields in ferroelectric crystals, and the three-dimensional mapping of strain fields around individual dislocations. This ability to directly characterize complex, multiscale phenomena in situ is a key step toward formulating and validating multiscale models that account for the entire heterogeneity of materials.
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