Etchability Dependence of InOx and ITO Thin Films by Plasma Enhanced Reactive Thermal Evaporation on Structural Properties and Deposition Conditions | Zendy

A. Amaral | Zendy; G. Lavareda | Zendy; C. de Nunes Carvalho | Zendy; Vânia André | Zendy; Y. Vygranenko | Zendy; M. Fernandes | Zendy; P. Brogueira | Zendy

Open Access

Etchability Dependence of InOx and ITO Thin Films by Plasma Enhanced Reactive Thermal Evaporation on Structural Properties and Deposition Conditions

Author(s) -

A. Amaral,

G. Lavareda,

C. de Nunes Carvalho,

Vânia André,

Y. Vygranenko,

M. Fernandes,

P. Brogueira

Publication year - 2018

Publication title -

mrs advances

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.253

H-Index - 15

eISSN - 2731-5894

pISSN - 2059-8521

DOI - 10.1557/adv.2018.113

Subject(s) - materials science , amorphous solid , evaporation , thin film , raman spectroscopy , analytical chemistry (journal) , indium tin oxide , deposition (geology) , substrate (aquarium) , indium , pulsed laser deposition , nanotechnology , crystallography , optics , metallurgy , paleontology , chemistry , physics , oceanography , chromatography , sediment , biology , geology , thermodynamics

The authors gratefully acknowledge T. Duarte for the X-ray diffraction facilities, "Fundacao para a Ciencia e a Tecnologia" for funding through a pluriannual contract with CeFEMA (UID/CTM/04540/2013) and fellowship (SFRH/BPD/102217/2014) for financial support of this research.

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