z-logo
open-access-imgOpen Access
Low Energy Ion Implantation and Annealing of Au/Ni/Ti Contacts to n-SiC
Author(s) -
Neelu Shrestha,
Martyn H. Kibel,
Patrick W. Leech,
Anthony S. Holland,
Geoffrey K. Reeves,
M. C. Ridgway,
Phillip Tanner
Publication year - 2017
Publication title -
mrs advances
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.253
H-Index - 15
eISSN - 2731-5894
pISSN - 2059-8521
DOI - 10.1557/adv.2017.314
Subject(s) - materials science , annealing (glass) , auger electron spectroscopy , ion , ion implantation , analytical chemistry (journal) , auger , metallurgy , atomic physics , chemistry , physics , chromatography , nuclear physics , organic chemistry

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom