Open AccessA High Temperature, Plasma-Assisted Chemical Vapor Deposition System
Author(s) -
RM Brusasco,
JA Britten,
CB Thorsness,
MS Scrivener,
W. Unites,
J. Campbell,
WL Johnson
Publication year - 1990
Publication title -
osti oai (u.s. department of energy office of scientific and technical information)
Language(s) - Uncategorized
Resource type - Book series
DOI - 10.1520/stp26512s
Subject(s) - plasma , materials science , chemical vapor deposition , deposition (geology) , chemical engineering , nanotechnology , physics , engineering , geology , nuclear physics , paleontology , sediment
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