Sinusoidal wavelength-scanning interferometer using an acousto-optic tunable filter for measurement of thickness and surface profile of a thin film | Zendy

Hisashi Akiyama | Zendy; Osami Sasaki | Zendy; Takamasa Suzuki | Zendy

Open Access

Sinusoidal wavelength-scanning interferometer using an acousto-optic tunable filter for measurement of thickness and surface profile of a thin film

Author(s) -

Hisashi Akiyama,

Osami Sasaki,

Takamasa Suzuki

Publication year - 2005

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/opex.13.010066

Subject(s) - optics , materials science , interferometry , wafer , wavelength , optical path length , interference (communication) , thin film , phase (matter) , laser , interference filter , filter (signal processing) , white light interferometry , signal (programming language) , amplitude , optoelectronics , physics , telecommunications , channel (broadcasting) , quantum mechanics , computer science , computer vision , programming language , nanotechnology

A sinusoidal wavelength-scanning interferometer for measuring thickness and surfaces profiles of a thin film has been proposed in which a superluminescent laser diode and an acousto-optic tunable filter are used. The interference signal contains an amplitude Zb of a time-varying phase and a constant phase alpha. Two values of an optical path difference (OPD) obtained from Zb and alpha, respectively, are combined to measure an OPD longer than a wavelength. The values of Zb and alpha are estimated by minimizing the difference between the detected signals and theoretical ones. From the estimated values, thickness and surface of a silicon dioxide film coated on an IC wafer with different thicknesses of 1 mum and 4 mum are measured with an error less than 5 nm.

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