Quasi-phase-matched second-harmonic generation in Ge-ion implanted fused silica channel waveguide

Channel waveguides were formed on fused silica substrate by Ge-ion implantation with lithographically defined channels. Thermal poling was performed to form second order optical nonlinearity (SON) in the waveguides. Periodical photo masks were designed and fabricated on a mask glass. Periodical erasure of the SON in the channel waveguides by 266 nm UV light with the photo mask on the fused silica substrate produced periodical SON distribution in the waveguides. First order quasi-phase-matching second-harmonic generation from 1064 nm to 532 nm was demonstrated in the channel waveguides.