z-logo
open-access-imgOpen Access
Near-infrared double negative metamaterials
Author(s) -
Shuang Zhang,
Wenjun Fan,
Kevin J. Malloy,
S. R. J. Brueck,
Nicolae C. Panoiu,
R. M. Osgood
Publication year - 2005
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/opex.13.004922
Subject(s) - metamaterial , optics , infrared , negative index metamaterials , negative refraction , refractive index , materials science , wavelength , semiconductor , transformation optics , optoelectronics , physics
We numerically demonstrate a metamaterial with both negative epsilon and negative mu over an overlapping near-infrared wavelength range resulting in a low loss negative-index material. Parametric studies optimizing this negative index are presented. This structure can be easily fabricated with standard semiconductor processing techniques.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom