Phosphorus-based compounds for EUV multilayer optics materials | Zendy

V. V. Medvedev | Zendy; Andrey Yakshin | Zendy; Robbert Wilhelmus Elisabeth van de Kruijs | Zendy; F. Bijkerk | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Phosphorus-based compounds for EUV multilayer optics materials

Author(s) -

V. V. Medvedev,

Andrey Yakshin,

Robbert Wilhelmus Elisabeth van de Kruijs,

F. Bijkerk

Publication year - 2015

Publication title -

optical materials express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.925

H-Index - 66

ISSN - 2159-3930

DOI - 10.1364/ome.5.001450

Subject(s) - extreme ultraviolet , extreme ultraviolet lithography , materials science , optics , ultraviolet , fabrication , phosphide , optoelectronics , reflector (photography) , boron , optical coating , nanotechnology , thin film , chemistry , laser , physics , light source , medicine , nickel , alternative medicine , organic chemistry , pathology , metallurgy

We have evaluated the prospects of phosphorus-based compounds in extreme ultraviolet multilayer optics. Boron phosphide (BP) is suggested to be used as a spacer material in reflective multilayer optics operating just above the L-photoabsorption edge of P (λ ≈9.2 nm). Mo, Ag, Ru, Rh, and Pd were considered for applications as reflector materials. Our calculations for multilayer structures with perfect interfaces show that the Pd/BP material combination suggests the highest reflectivity values, exceeding 70% within the 9.2 – 10.0 nm spectral range. We also discuss the potential of fabrication of BP-based multilayer structures for optical applications in the extreme ultraviolet rang

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research