Investigation of metal sulfide optical thin film growth in low-loss IR hollow glass waveguides

In this study, the film growth kinetics for near and mid-IR reflection enhancing CdS and PbS dielectric thin films in HGWs is experimentally established. Crucial fabrication parameters including solution concentrations, pH, and fluid velocity are optimized. The film thickness of these films in HGWs is studied as a function of deposition time and temperature. Through IR spectral response analysis, the dielectric thin film thicknesses were determined and found to have a strong linear time dependence. Accurate metal sulfide film growth models in HGWs were developed, allowing for direct determination of necessary deposition times to yield metal sulfide HGW thin film coatings having a desired response.