Localized surface plasmon resonance enhanced photoluminescence from SiNx with different N/Si ratios | Zendy

Feng Wang | Zendy; Minghua Wang | Zendy; Dongsheng Li | Zendy; Deren Yang | Zendy

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Localized surface plasmon resonance enhanced photoluminescence from SiNx with different N/Si ratios

Author(s) -

Feng Wang,

Minghua Wang,

Dongsheng Li,

Deren Yang

Publication year - 2012

Publication title -

optical materials express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.925

H-Index - 66

ISSN - 2159-3930

DOI - 10.1364/ome.2.001437

Subject(s) - photoluminescence , materials science , surface plasmon resonance , surface plasmon , optoelectronics , resonance (particle physics) , plasmon , localized surface plasmon , refractive index , optics , nanotechnology , nanoparticle , atomic physics , physics

Silver (Ag) nanostructures with different sizes and densities were deposited onto the luminescence matrixes to improve the photoluminescence (PL) intensity of silicon nitride (SiNx) films via localized surface plasmon resonance (LSPR) coupling. The shape of PL spectra from the SiNx matrixes is mainly determined by their stoichiometric ratio. Moreover, both the surface coverage and the size of Ag nanostructures should be considered for the improvement of PL intensity. The optimal PL intensity of SiNx films might be achieved by the addition of Ag nanostructures with proper surface coverage and size due to the enhanced photo-excitation by LSPR. The dipolar resonance absorption of Ag nanostructures has an insignificant contribution on this improvement. © 2012 Optical Society of America.

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