Nanoimprinting reflow modified moth-eye structures in chalcogenide glass for enhanced broadband antireflection in the mid-infrared | Zendy

Mikkel R. Lotz | Zendy; Julius Lucas Needham | Zendy; Mogens Jakobsen | Zendy; Rafael Taboryski | Zendy

Open Access

Nanoimprinting reflow modified moth-eye structures in chalcogenide glass for enhanced broadband antireflection in the mid-infrared

Author(s) -

Mikkel R. Lotz,

Julius Lucas Needham,

Mogens Jakobsen,

Rafael Taboryski

Publication year - 2019

Publication title -

optics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.524

H-Index - 272

eISSN - 1071-2763

pISSN - 0146-9592

DOI - 10.1364/ol.44.004383

Subject(s) - materials science , transmittance , anti reflective coating , nanoimprint lithography , optics , lithography , fabrication , optoelectronics , infrared , broadband , glazing , mold , chalcogenide , ultraviolet , electron beam lithography , soft lithography , resist , nanotechnology , composite material , coating , medicine , alternative medicine , physics , pathology , layer (electronics)

We report on the progress towards developing a new method for fabricating more efficient, broadband antireflective (AR) moth-eye structures in As 2 Se 3 via a direct nanoimprinting technique. Thermal reflow is used during mold fabrication to reshape a conventional deep-ultraviolet lithography in order to promote a pattern transfer of "secant ogive"-like moth-eye structures. Once replicated, structures modified by reflow displayed greater AR efficiency compared to structures replicated by a conventional mold, achieving the highest spectrum-averaged transmittance improvement of 12.36% from 3.3 to 12 μm.

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