Fabrication of low-loss silicon-on-oxidized-porous-silicon strip waveguide using focused proton-beam irradiation | Zendy

E. J. Teo | Zendy; Andrew A. Bettiol | Zendy; P. Y. Yang | Zendy; Mark B. H. Breese | Zendy; B. Q. Xiong | Zendy; Goran Z. Mashanovich | Zendy; William R. Headley | Zendy; Graham T. Reed | Zendy

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Fabrication of low-loss silicon-on-oxidized-porous-silicon strip waveguide using focused proton-beam irradiation

Author(s) -

E. J. Teo,

Andrew A. Bettiol,

P. Y. Yang,

Mark B. H. Breese,

B. Q. Xiong,

Goran Z. Mashanovich,

William R. Headley,

Graham T. Reed

Publication year - 2009

Publication title -

optics letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.524

H-Index - 272

eISSN - 1071-2763

pISSN - 0146-9592

DOI - 10.1364/ol.34.000659

Subject(s) - materials science , silicon , optics , porous silicon , optoelectronics , etching (microfabrication) , fluence , fabrication , irradiation , waveguide , nanotechnology , laser , medicine , physics , alternative medicine , layer (electronics) , pathology , nuclear physics

We have successfully fabricated low-loss silicon-on-oxidized-porous-silicon (SOPS) strip waveguides with high-index contrast using focused proton-beam irradiation and electrochemical etching. Smooth surface quality with rms roughness of 3.1 nm is achieved for a fluence of 1x10(15)/cm(2) after postoxidation treatment. Optical characterization at a wavelength of 1550 nm shows a loss of 1.1+/-0.4 dB/cm and 1.2+/-0.4 dB/cm in TE and TM polarization respectively, which we believe is the lowest reported loss for SOPS waveguides. This opens up new opportunities for all-silicon-based optoelectronics applications.

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