Open AccessSmallest lithographic marks generated by optical focusing systems
Author(s) -
Thierry Grosjean,
D. Courjon,
C. Bainier
Publication year - 2007
Publication title -
optics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.524
H-Index - 272
eISSN - 1071-2763
pISSN - 0146-9592
DOI - 10.1364/ol.32.000976
Subject(s) - optics , lithography , 3d optical data storage , optical storage , polarization (electrochemistry) , bessel function , materials science , electron beam lithography , physics , resist , nanotechnology , chemistry , layer (electronics)
We show that the combination of Bessel beams and photosensitive materials exhibiting polarization filtering properties allows one to reach the smallest mark that can be lithographically generated by focusing systems. This property is of interest in current optical data storage techniques.
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