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Temperature dependence of optical properties for amorphous silicon at wavelengths of 6328 and 752 nm
Author(s) -
Oğuz Yavaṣ,
Nhan Do,
A. C. Tam,
P. T. Leung,
W. P. Leung,
Hee K. Park,
Costas P. Grigoropoulos,
Johannes Boneberg,
P. Leǐderer
Publication year - 1993
Publication title -
optics letters
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.524
H-Index - 272
eISSN - 1071-2763
pISSN - 0146-9592
DOI - 10.1364/ol.18.000540
Subject(s) - refractive index , materials science , molar absorptivity , wavelength , optics , amorphous silicon , amorphous solid , extinction (optical mineralogy) , silicon , attenuation coefficient , temperature coefficient , extinction ratio , optoelectronics , crystalline silicon , physics , chemistry , organic chemistry , composite material
The temperature dependence of the optical properties for amorphous silicon is studied at wavelengths of 632.8 and 752 nm. Both the refractive index and extinction coefficient increase linearly with temperature for 752 nm, while the refractive index decreases and the extinction coefficient increases for 632.8 nm. The rate of increase of the extinction coefficient at 632.8 nm is twice as much as that for 752 nm.

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