Systematic study of Si-based GeSn photodiodes with 26 µm detector cutoff for short-wave infrared detection
Author(s) -
Thach Pham,
Wei Du,
Huong Tran,
Joe Margetis,
John Tolle,
Greg Sun,
Richard Soref,
Hameed A. Naseem,
Baohua Li,
Shui-Qing Yu
Publication year - 2016
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.24.004519
Subject(s) - photodiode , responsivity , materials science , optoelectronics , photodetector , optics , detector , specific detectivity , cutoff frequency , infrared , substrate (aquarium) , chemical vapor deposition , wavelength , physics , oceanography , geology
Normal-incidence Ge 1-x Sn x photodiode detectors with Sn compositions of 7 and 10% have been demonstrated. Such detectors were based on Ge/Ge 1-x Sn x /Ge double heterostructures grown directly on a Si substrate via a chemical vapor deposition system. A temperature-dependence study of these detectors was conducted using both electrical and optical characterizations from 300 to 77 K. Spectral response up to 2.6 µm was achieved for a 10% Sn device at room temperature. The peak responsivity and specific detectivity (D*) were measured to be 0.3 A/W and 4 × 10 9 cmHz 1/2 W -1 at 1.55 µm, respectively. The spectral D* of a 7% Sn device at 77 K was only one order-of-magnitude lower than that of an extended-InGaAs photodiode operating in the same wavelength range, indicating the promising future of GeSn-based photodetectors.
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