z-logo
open-access-imgOpen Access
Systematic study of Si-based GeSn photodiodes with 26 µm detector cutoff for short-wave infrared detection
Author(s) -
Thach Pham,
Wei Du,
Huong Tran,
Joe Margetis,
John Tolle,
Greg Sun,
Richard Soref,
Hameed A. Naseem,
Baohua Li,
Shui-Qing Yu
Publication year - 2016
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.24.004519
Subject(s) - photodiode , responsivity , materials science , optoelectronics , photodetector , optics , detector , specific detectivity , cutoff frequency , infrared , substrate (aquarium) , chemical vapor deposition , wavelength , physics , oceanography , geology
Normal-incidence Ge 1-x Sn x photodiode detectors with Sn compositions of 7 and 10% have been demonstrated. Such detectors were based on Ge/Ge 1-x Sn x /Ge double heterostructures grown directly on a Si substrate via a chemical vapor deposition system. A temperature-dependence study of these detectors was conducted using both electrical and optical characterizations from 300 to 77 K. Spectral response up to 2.6 µm was achieved for a 10% Sn device at room temperature. The peak responsivity and specific detectivity (D*) were measured to be 0.3 A/W and 4 × 10 9 cmHz 1/2 W -1 at 1.55 µm, respectively. The spectral D* of a 7% Sn device at 77 K was only one order-of-magnitude lower than that of an extended-InGaAs photodiode operating in the same wavelength range, indicating the promising future of GeSn-based photodetectors.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom