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Growth and characterization of SiGeSn quantum well photodiodes
Author(s) -
Inga A. Fischer,
Torsten Wendav,
Lion Augel,
Songchai Jitpakdeebodin,
Filipe Oliveira,
A. Benedetti,
Stefan Stefanov,
S. Chiussi,
Giovanni Capellini,
Kurt Busch,
Jörg Schulze
Publication year - 2015
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.23.025048
Subject(s) - responsivity , optoelectronics , fabrication , photodiode , materials science , diode , electroluminescence , quantum well , optics , characterization (materials science) , quantum efficiency , doping , photodetector , physics , laser , nanotechnology , medicine , alternative medicine , pathology , layer (electronics)
We report on the fabrication and electro-optical characterization of SiGeSn multi-quantum well PIN diodes. Two types of PIN diodes, in which two and four quantum wells with well and barrier thicknesses of 10 nm each are sandwiched between B- and Sb-doped Ge-regions, were fabricated as single-mesa devices, using a low-temperature fabrication process. We discuss measurements of the diode characteristics, optical responsivity and room-temperature electroluminescence and compare with theoretical predictions from band structure calculations.

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