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Electro-optical switching at 1550 nm using a two-state GeSe phase-change layer
Author(s) -
Richard Soref,
Joshua R. Hendrickson,
Haibo Liang,
Arka Majumdar,
Jianwei Mu,
Xun Li,
WeiPing Huang
Publication year - 2015
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.23.001536
Subject(s) - optics , materials science , layer (electronics) , phase change , phase (matter) , optical switch , optoelectronics , physics , nanotechnology , quantum mechanics , engineering physics
New designs for electro-optical free-space and waveguided 2 x 2 switches are presented and analyzed at the 1.55 μm telecoms wavelength. The proposed devices employ a ~10 nm film of GeSe that is electrically actuated to transition the layer forth-and-back from the amorphous to the crystal phase, yielding a switch with two self-sustaining states. This phase change material was selected for its very low absorption loss at the operation wavelength, along with its electro-refraction Δn ~0.6. All switches are cascadeable into N x M devices. The free-space prism-shaped structures use III-V prism material to match the GeSe crystal index. The Si/GeSe/Si "active waveguides" are quite suitable for directional-coupler switches as well as Mach-Zehnder devices-all of which have an active length 16x less than that in the free-carrier art.

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