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Arbitrary GRIN component fabrication in optically driven diffusive photopolymers
Author(s) -
Adam C. Urness,
Kenneth M. Anderson,
Chungfang Ye,
William L. Wilson,
Robert R. McLeod
Publication year - 2015
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.23.000264
Subject(s) - optics , lithography , materials science , refractive index , lens (geology) , gradient index optics , photomask , photopolymer , zernike polynomials , light intensity , optoelectronics , resist , physics , polymer , wavefront , layer (electronics) , composite material , polymerization
We introduce a maskless lithography tool and optically-initiated diffusive photopolymer that enable arbitrary two-dimensional gradient index (GRIN) polymer lens profiles. The lithography tool uses a pulse-width modulated deformable mirror device (DMD) to control the 8-bit gray-scale intensity pattern on the material. The custom polymer responds with a self-developing refractive index profile that is non-linear with optical dose. We show that this nonlinear material response can be corrected with pre-compensation of the intensity pattern to yield high fidelity, optically induced index profiles. The process is demonstrated with quadratic, millimeter aperture GRIN lenses, Zernike polynomials and GRIN Fresnel lenses.

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