Si^+-implanted Si-wire waveguide photodetectors for the mid-infrared
Author(s) -
Brian Souhan,
Richard R. Grote,
Christine P. Chen,
Hsu-Cheng Huang,
Jeffrey B. Driscoll,
Ming Lu,
Aaron Stein,
H. Bakhru,
Keren Bergman,
William M. J. Green,
Richard M. Osgood
Publication year - 2014
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.22.027415
Subject(s) - photodetector , photocurrent , materials science , optoelectronics , dark current , wavelength , optics , quantum efficiency , infrared , waveguide , photonics , photonic integrated circuit , annealing (glass) , physics , composite material
CMOS-compatible Si⁺-implanted Si-waveguide p-i-n photodetectors operating at room temperature and at mid-infrared wavelengths from 2.2 to 2.3 µm are demonstrated. Responsivities of 9.9 ± 2.0 mA/W are measured at a 5 V reverse bias with an estimated internal quantum efficiency of 2.7 - 4.5%. The dark current is found to vary from a few microamps down to less than a nanoamp after a post-implantation annealing of 350°C. The measured photocurrent dependence on input power shows a linear correspondence over more than three decades, and the frequency response of a 250 µm-length p-i-n device is measured to be ~1.7 GHz for a wavelength of λ = 2.2 µm, thus potentially opening up new communication bands for photonic integrated circuits.
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