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Effect of surface roughness on self-assembled monolayer plasmonic ruler in nonlocal regime
Author(s) -
Ghazal Hajisalem,
Min Qiao,
Ryan F. Gelfand,
Reuven Gordon
Publication year - 2014
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.22.009604
Subject(s) - materials science , plasmon , monolayer , surface plasmon resonance , optics , surface finish , raman spectroscopy , surface roughness , chemical mechanical planarization , raman scattering , surface plasmon polariton , resonance (particle physics) , wavelength , saturation (graph theory) , surface plasmon , optoelectronics , nanotechnology , nanoparticle , physics , atomic physics , mathematics , layer (electronics) , combinatorics , composite material
Recently, self-assembled monolayers (SAMs) have been used for plasmonic rulers to measure the nonlocal influence on the Au nanoparticle - metal film resonance wavelength shift and probe the ultimate field enhancement. Here we examine the influence of surface roughness on this plasmonic ruler in the nonlocal regime by comparing plasmonic resonance shifts for as-deposited and for ultra-flat Au films. It is shown that the resonance shift is larger for ultra-flat films, suggesting that there is not the saturation from nonlocal effects previously reported for the spacer range from 0.7 nm to 1.6 nm. We attribute the previously reported saturation to the planarization of the as-deposited films by thinner SAMs, as measured here by atomic-force microscopy. This work is of interest both in probing the ultimate limits of plasmonic enhancement with SAMs for applications in Raman and nonlinear optics, but also in the study of SAMs planarization as a function surface roughness.

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