Thermal stress implications in athermal TiO_2 waveguides on a silicon substrate | Zendy

Jock Bovington | Zendy; Rui Wu | Zendy; KwangTing Cheng | Zendy; John E. Bowers | Zendy

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Thermal stress implications in athermal TiO_2 waveguides on a silicon substrate

Author(s) -

Jock Bovington,

Rui Wu,

KwangTing Cheng,

John E. Bowers

Publication year - 2014

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.22.000661

Subject(s) - materials science , substrate (aquarium) , silicon , thermal , resonator , multiphysics , optics , optoelectronics , stress (linguistics) , finite element method , linguistics , oceanography , physics , philosophy , meteorology , thermodynamics , geology

Ring resonators with TiO2 core confinement factors from 0.07 to 0.42 are fabricated and measured for thermal sensitivity achieving -2.9 pm/K thermal drift in the best case. Materials used are CMOS compatible (TiO2, SiO2 and Si3N4) on a Si substrate. The under discussed role of stress in thermo-optic behavior is clearly observed when contrasting waveguides buried in SiO2 to those with etched sidewalls revealed to air. Multiphysics simulations are conducted to provide a theoretical explanation of this phenomenon in contrast to the more widely reported theories on thermo-optic behavior dominated by confinement factor.

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