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A compact bi-wavelength polarization splitting grating coupler fabricated in a 220 nm SOI platform
Author(s) -
Matthew Streshinsky,
Ruizhi Shi,
Ari Novack,
Roger Tern Poh Cher,
Andy Eu-Jin Lim,
Patrick Lo,
Tom BaehrJones,
Michael Hochberg
Publication year - 2013
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.21.031019
Subject(s) - materials science , optics , insertion loss , silicon on insulator , grating , wavelength , polarization (electrochemistry) , fiber bragg grating , optoelectronics , diffraction grating , silicon , physics , chemistry
We experimentally demonstrate a polarization splitting grating coupler that is operational near 1310 nm and 1550 nm in a silicon-on-insulator platform, using the same fiber angle for both wavelength bands. At 1550 nm, the device has an insertion loss of 7.1 dB and a 1.5-dB transmission window of 35 nm. At 1310 nm, the insertion loss and 1.5-dB transmission window are 8.2 dB and 18 nm, respectively. Polarization isolation at 1550 nm is 24 dB. This is the first experimental demonstration of a bi-wavelength polarization-splitting grating coupler.

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