z-logo
open-access-imgOpen Access
Nano-Cr-film-based solar selective absorber with high photo-thermal conversion efficiency and good thermal stability
Author(s) -
Wei-Xi Zhou,
Yan Shen,
Ertao Hu,
Yuan Zhao,
Ming-Yu Sheng,
Yu-Xiang Zheng,
Songyou Wang,
YoungPak Lee,
CaiZhuang Wang,
D. W. Lynch,
LiangYao Chen
Publication year - 2012
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.20.028953
Subject(s) - materials science , thermal emittance , optics , thermal stability , thin film , optoelectronics , selective surface , dielectric , layer (electronics) , sputter deposition , energy conversion efficiency , thermal , absorption (acoustics) , sputtering , composite material , nanotechnology , beam (structure) , physics , quantum mechanics , meteorology
Optical properties and thermal stability of the solar selective absorber based on the metal/dielectric four-layer film structure were investigated in the variable temperature region. Numerical calculations were performed to simulate the spectral properties of multilayer stacks with different metal materials and film thickness. The typical four-layer film structure using the transition metal Cr as the thin solar absorbing layer [SiO(2)(90nm)/Cr(10nm)/SiO(2)(80nm)/Al (≥100nm)] was fabricated on the Si or K9 glass substrate by using the magnetron sputtering method. The results indicate that the metal/dielectric film structure has a good spectral selective property suitable for solar thermal applications with solar absorption efficiency higher than 95% in the 400-1200nm wavelength range and a very low thermal emittance in the infrared region. The solar selective absorber with the thin Cr layer has shown a good thermal stability up to the temperature of 873K under vacuum atmosphere. The experimental results are in good agreement with the calculated spectral results.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom