High quality factor and high confinement silicon resonators using etchless process | Zendy

Austin G. Griffith | Zendy; Jaime Cárdenas | Zendy; Carl B. Poitras | Zendy; Michal Lipson | Zendy

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High quality factor and high confinement silicon resonators using etchless process

Author(s) -

Austin G. Griffith,

Jaime Cárdenas,

Carl B. Poitras,

Michal Lipson

Publication year - 2012

Publication title -

optics express

Language(s) - English

Resource type - Book series

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

ISBN - 978-1-4673-1839-6

DOI - 10.1364/oe.20.021341

Subject(s) - resonator , materials science , optics , silicon , q factor , quality (philosophy) , radius , bend radius , optoelectronics , whispering gallery wave , waveguide , refractive index , bending , physics , composite material , computer security , quantum mechanics , computer science

We demonstrate high quality factor and high confinement in a silicon ring resonator fabricated by a thermal oxidation process. We fabricated a 50 μm bending radius racetrack resonator, with a 5 μm coupling region. We achieved an intrinsic quality factor of 760,000 for the fundamental TM mode, which corresponds to a propagation loss of 0.9 dB/cm. Both the fundamental TE and TM modes are highly confined in the waveguide, with effective indices of 3.0 for the TE mode and 2.9 for the TM mode.

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