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Direct measurement of the near-field super resolved focused spot in InSb
Author(s) -
Alberto C. Assafrao,
Arthur J. H. Wachters,
Marcel A. Verheijen,
A. M. Nugrowati,
Silvania F. Pereira,
H. P. Urbach,
M. Armand,
S. Olivier
Publication year - 2012
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.20.010426
Subject(s) - optics , diffraction , near and far field , materials science , laser , resolution (logic) , wavelength , microscopy , image resolution , microscope , near field scanning optical microscope , 3d optical data storage , optical storage , optical microscope , physics , scanning electron microscope , artificial intelligence , computer science
Under appropriate laser exposure, a thin film of InSb exhibits a sub-wavelength thermally modified area that can be used to focus light beyond the diffraction limit. This technique, called Super-Resolution Near-Field Structure, is a potential candidate for ultrahigh density optical data storage and many other high-resolution applications. We combined near field microscopy, confocal microscopy and time resolved pump-probe technique to directly measure the induced sub-diffraction limited spot in the near-field regime. The measured spot size was found to be dependent on the laser power and a decrease of 25% (100 nm) was observed. Experimental evidences that support a threshold-like simulation model to describe the effect are also provided. The experimental data are in excellent agreement with rigorous simulations obtained with a three dimensional Finite Element Method code.

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