Full-field microimaging with 8 keV X-rays achieves a spatial resolutions better than 20 nm | Zendy

TsungYu Chen | Zendy; Yu-Tung Chen | Zendy; Chengliang Wang | Zendy; Ivan M. Kempson | Zendy; Ivan Lee | Zendy; Yong S. Chu | Zendy; Y. Hwu | Zendy; G. Margaritondo | Zendy

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Full-field microimaging with 8 keV X-rays achieves a spatial resolutions better than 20 nm

Author(s) -

TsungYu Chen,

Yu-Tung Chen,

Chengliang Wang,

Ivan M. Kempson,

Ivan Lee,

Yong S. Chu,

Y. Hwu,

G. Margaritondo

Publication year - 2011

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.19.019919

Subject(s) - optics , zone plate , fresnel zone , electron beam lithography , lithography , materials science , image resolution , photon , fabrication , transmission (telecommunications) , physics , optoelectronics , diffraction , resist , nanotechnology , medicine , alternative medicine , electrical engineering , engineering , layer (electronics) , pathology

Fresnel zone plates (450 nm thick Au, 25 nm outermost zone width) used as objective lenses in a full field transmission reached a spatial resolution better than 20 nm and 1.5% efficiency with 8 keV photons. Zernike phase contrast was also realized without compromising the resolution. These are very significant achievements in the rapid progress of high-aspect-ratio zone plate fabrication by combined electron beam lithography and electrodeposition.

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