Laser erasable implanted gratings for integrated silicon photonics
Author(s) -
Renzo Loiacono,
Graham T. Reed,
Goran Z. Mashanovich,
R. Gwilliam,
Simon J. Henley,
Youfang Hu,
Ran Feldesh,
Richard Jones
Publication year - 2011
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.19.010728
Subject(s) - materials science , optics , laser , extinction ratio , optoelectronics , silicon , fiber bragg grating , photonics , photonic integrated circuit , germanium , silicon on insulator , wavelength , physics
In this work we experimentally demonstrate laser erasable germanium implanted Bragg gratings in SOI. Bragg gratings are formed in a silicon waveguide by ion implantation induced amorphization, and are subsequently erased by a contained laser thermal treatment process. An extinction ratio up to 24dB has been demonstrated in transmission for the fabricated implanted Bragg gratings with lengths up to 1000µm. Results are also presented, demonstrating that the gratings can be selectively removed by UV pulsed laser annealing, enabling a new concept of laser erasable devices for integrated photonics.
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