High quality factor etchless silicon photonic ring resonators | Zendy

Lian-Wee Luo | Zendy; Gustavo S. Wiederhecker | Zendy; Jaime Cárdenas | Zendy; Carl B. Poitras | Zendy; Michal Lipson | Zendy

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High quality factor etchless silicon photonic ring resonators

Author(s) -

Lian-Wee Luo,

Gustavo S. Wiederhecker,

Jaime Cárdenas,

Carl B. Poitras,

Michal Lipson

Publication year - 2011

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.19.006284

Subject(s) - resonator , silicon , materials science , etching (microfabrication) , optics , q factor , optoelectronics , hybrid silicon laser , silicon photonics , photonics , fabrication , radius , ring (chemistry) , layer (electronics) , physics , nanotechnology , chemistry , computer security , organic chemistry , computer science , medicine , alternative medicine , pathology

We demonstrate high quality factor etchless silicon photonic ring resonators fabricated by selective thermal oxidation of silicon without the silicon layer being exposed to any plasma etching throughout the fabrication process. We achieve a high intrinsic quality factor of 510,000 in 50 µm-radius ring resonators, corresponding to a ring loss of 0.8 dB/cm. The device has a total chip insertion loss of 2.5 dB, achieved by designing etchless silicon inverse nanotapers at both the input and output of the chip.

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