Nonlinear propagation in silicon-based plasmonic waveguides from the standpoint of applications
Author(s) -
Ivan D. Rukhlenko,
Malin Premaratne,
Govind P. Agrawal
Publication year - 2010
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.19.000206
Subject(s) - plasmon , silicon , silicon photonics , optoelectronics , photonics , materials science , nanophotonics , raman scattering , optics , nonlinear optics , absorption (acoustics) , raman spectroscopy , physics , laser
Silicon-based plasmonic waveguides can be used to simultaneously transmit electrical signals and guide optical energy with deep subwavelength localization, thus providing us with a well needed connecting link between contemporary nanoelectronics and silicon photonics. In this paper, we examine the possibility of employing the large third-order nonlinearity of silicon to create active and passive photonic devices with silicon-based plasmonic waveguides. We unambiguously demonstrate that the relatively weak dependance of the Kerr effect, two-photon absorption (TPA), and stimulated Raman scattering on optical intensity, prevents them from being useful in μm-long plasmonic waveguides. On the other hand, the TPA-initiated free-carrier effects of absorption and dispersion are much more vigorous, and have strong potential for a variety of practical applications. Our work aims to guide research efforts towards the most promising nonlinear optical phenomena in the thriving new field of silicon-based plasmonics.
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