Sub-15 nm beam confinement by two crossed x-ray waveguides | Zendy

Sven Krüger | Zendy; Klaus Giewekemeyer | Zendy; Sebastian Kalbfleisch | Zendy; M. Bartels | Zendy; H. Neubauer | Zendy; Tim Salditt | Zendy

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Sub-15 nm beam confinement by two crossed x-ray waveguides

Author(s) -

Sven Krüger,

Klaus Giewekemeyer,

Sebastian Kalbfleisch,

M. Bartels,

H. Neubauer,

Tim Salditt

Publication year - 2010

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.18.013492

Subject(s) - optics , full width at half maximum , waveguide , planar , holography , diffraction , beam (structure) , electron beam lithography , physics , phase (matter) , amplitude , materials science , computer graphics (images) , layer (electronics) , quantum mechanics , computer science , resist , composite material

We have combined two high transmission planar x-ray waveguides glued onto each other in a crossed geometry to form an effective quasi-point source. From measurements of the far-field diffraction pattern, the phase and amplitude of the near-field distribution is retrieved using the error-reduction algorithm. In agreement with finite difference field simulations (forward calculation), the reconstructed exit wave intensity distribution (inverse calculation) exhibits a full width at half maximum (FWHM) below 15 nm in both dimensions. Finally, holographic imaging is successfully demonstrated for the crossed waveguide device by translation of a lithographic test structure through the waveguide beam.

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