High-contrast waveguides in sputtered pure TeO,_2 glass thin films
Author(s) -
Silvia Maria Pietralunga,
Marta Lanata,
Massimo Feré,
Davide Piccinin,
G. Cusmai,
M. Torregiani,
M. Martinelli
Publication year - 2008
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.16.021662
Subject(s) - materials science , optics , thin film , wafer , etching (microfabrication) , refractive index , waveguide , lithography , refractive index contrast , optoelectronics , surface finish , fabrication , composite material , nanotechnology , layer (electronics) , pathology , medicine , physics , alternative medicine
We present a technological approach to the realization of channeled optical waveguides, starting from reactively sputtered tellurite glass thin films, grown on silica-coated 4" Si wafers. In particular, optical lithographic process and etching recipes have been developed to overcome the solubility of TeO(2) films in aqueous solutions, and to process them into high-index contrast structures with minimized post-etch roughness. Optical tests on preliminary rib waveguide geometries feature 6.3 dB/cm propagation loss for fundamental TE mode at lambda = 1.5 microm.
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