Accurate frequency alignment in fabrication of high-order microring-resonator filters | Zendy

Jie Sun | Zendy; Charles W. Holzwarth | Zendy; Marcus S. Dahlem | Zendy; J. Todd Hastings | Zendy; Henry I. Smith | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Accurate frequency alignment in fabrication of high-order microring-resonator filters

Author(s) -

Jie Sun,

Charles W. Holzwarth,

Marcus S. Dahlem,

J. Todd Hastings,

Henry I. Smith

Publication year - 2008

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.16.015958

Subject(s) - resonator , optics , distortion (music) , electron beam lithography , fabrication , materials science , lithography , filter (signal processing) , optical filter , optoelectronics , physics , computer science , resist , amplifier , medicine , alternative medicine , cmos , layer (electronics) , pathology , computer vision , composite material

Frequency mismatch in high-order microring-resonator filters is investigated. We demonstrate that this frequency mismatch is caused mainly by the intrafield distortion of scanning-electron-beam-lithography (SEBL) used in fabrication. The intrafield distortion of an SEBL system is measured, and a simple method is also proposed to correct this distortion. By applying this correction method, the average frequency mismatch in second-order microring-resonator filters was reduced from -8.6 GHz to 0.28 GHz.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research