Epitaxially-grown Ge/Si avalanche photodiodes for 1.3 μm light detection
Author(s) -
Yunlu Kang,
Moshe Zadka,
Stas Litski,
Gadi Sarid,
M. Morse,
Mario Paniccia,
Y.-H. Kuo,
John E. Bowers,
Andréas Beling,
H. -D. Liu,
Dion McIntosh,
Joe C. Campbell,
A. Pauchard
Publication year - 2008
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.16.009365
Subject(s) - responsivity , avalanche photodiode , photodiode , materials science , optoelectronics , epitaxy , optics , silicon , dark current , photodetector , detector , physics , layer (electronics) , composite material
We designed and fabricated Ge/Si avalanche photodiodes grown on silicon substrates. The mesa-type photodiodes exhibit a responsivity at 1310 nm of 0.54 A/W, a breakdown voltage thermal coefficient of 0.05%/ degrees C, a 3 dB-bandwidth of 10 GHz. The gain-bandwidth product was measured as 153 GHz. The effective k value extracted from the excess noise factor was 0.1.
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