Using colloidal lithography to fabricate and optimize sub-wavelength pyramidal and honeycomb structures in solar cells
Author(s) -
HsuenLi Chen,
S. Y. Chuang,
Cheng-Hung Lin,
YuTing Lin
Publication year - 2007
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.15.014793
Subject(s) - materials science , optics , honeycomb , honeycomb structure , lithography , finite difference time domain method , reflection (computer programming) , nanosphere lithography , wavelength , structural coloration , optoelectronics , pyramid (geometry) , etching (microfabrication) , bilayer , reactive ion etching , photonic crystal , nanotechnology , fabrication , layer (electronics) , composite material , medicine , physics , alternative medicine , pathology , membrane , biology , computer science , genetics , programming language
The external quantum efficiency of solar cells can be improved by using texturing pyramid- and honeycomb-like structures with minimum reflection. In this study, we investigated the reflection properties of texturing structures through rigorous coupled-wave analysis and the three-dimensional finite-difference time domains (FDTD) method to analyze close-packed texturing structures. We also demonstrate a simple method-combining sub-wavelength-scale monolayer and bilayer polystyrene spheres with a one-step reactive ion etching process-to fabricate optimized pyramid- and honeycomb-shaped antireflection structures, respectively. Thus, sub-wavelength pyramidal and honeycomb-like structures displaying low reflectance were obtained readily without the need for any lithography equipment.
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