Fabricating three-dimensional nanostructures using two photon lithography in a single exposure step | Zendy

Seokwoo Jeon | Zendy; Viktor Malyarchuk | Zendy; John A. Rogers | Zendy; Gary P. Wiederrecht | Zendy

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Fabricating three-dimensional nanostructures using two photon lithography in a single exposure step

Author(s) -

Seokwoo Jeon,

Viktor Malyarchuk,

John A. Rogers,

Gary P. Wiederrecht

Publication year - 2006

Publication title -

optics express

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 1.394

H-Index - 271

ISSN - 1094-4087

DOI - 10.1364/oe.14.002300

Subject(s) - conformable matrix , lithography , photonics , optics , materials science , holography , nanostructure , nanotechnology , optoelectronics , physics , composite material

Conformable phase masks, transparent photopolymers and two photon effects provide the basis for a simple, parallel lithographic technique that can form complex, but well defined three-dimensional (3D) nanostructures in a single exposure step. This paper describes the method, presents examples of its ability to form 3D nanostructures (including freestanding particles with controlled shapes) and comprehensive modeling of the associated optics. Single step, large area 3D pattern definition, subwavelength resolution and experimental simplicity represent features that make this method potentially useful for applications in photonics, biotechnology and other areas.

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