Blazed grating fabrication through gray-scale Xray lithography
Author(s) -
Pantazis Mouroulis,
Frank Hartley,
Daniel W. Wilson,
Victor White,
Aidan Shori,
Steven Nguyen,
Min Zhang,
Martin Feldman
Publication year - 2003
Publication title -
optics express
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 1.394
H-Index - 271
ISSN - 1094-4087
DOI - 10.1364/oe.11.000270
Subject(s) - optics , lithography , fabrication , materials science , grating , x ray lithography , resist , diffraction efficiency , diffraction grating , electron beam lithography , nanoimprint lithography , next generation lithography , optoelectronics , blazed grating , nanotechnology , physics , medicine , alternative medicine , pathology , layer (electronics)
Blazed gratings have been fabricated using gray-scale X-ray lithography. The gratings have high efficiency, low parasitic light, and high groove quality. The fabrication technique and resist characterization are described. The gratings can be generated over a considerable range of distances from the X-ray mask, thus demonstrating the ability to write gratings on a substrate of effectively arbitrary shape.
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