Lloyd’s Interference Lithography System Employing Beam Shaping Technique for Wafer-scale Nano-patterning | Zendy

Han-Jung Chang | Zendy; Ping-Chien Chang | Zendy; YungJr Hung | Zendy

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Lloyd’s Interference Lithography System Employing Beam Shaping Technique for Wafer-scale Nano-patterning

Author(s) -

Han-Jung Chang,

Ping-Chien Chang,

YungJr Hung

Publication year - 2016

Publication title -

conference on lasers and electro-optics

Language(s) - English

Resource type - Conference proceedings

DOI - 10.1364/cleo_si.2016.sm2r.7

Subject(s) - wafer , optics , interference (communication) , interference lithography , lithography , grating , interferometry , materials science , electron beam lithography , photolithography , x ray lithography , next generation lithography , optoelectronics , nanoscopic scale , nano , diffraction grating , physics , nanotechnology , resist , engineering , telecommunications , fabrication , medicine , channel (broadcasting) , alternative medicine , pathology , layer (electronics) , composite material

An expanded and top-hat light intensity distribution is generated in a Lloyd's mirror interferometer to realize an uniform 2D grating with a circular geometry and a 2.5% filling factor variation over the entire two-inch wafer.

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