z-logo
open-access-imgOpen Access
Refractive index determination by coherence scanning interferometry
Author(s) -
Hirokazu Yoshino,
Piotr Kamiński,
Roger Smith,
John M. Walls,
Daniel Mansfield
Publication year - 2016
Publication title -
applied optics
Language(s) - English
Resource type - Journals
ISSN - 0003-6935
DOI - 10.1364/ao.55.004253
Subject(s) - optics , materials science , refractive index , interferometry , metrology , ellipsometry , thin film , white light interferometry , surface finish , silicon , surface roughness , optoelectronics , nanotechnology , physics , composite material
Coherence scanning interferometry is established as a powerful noncontact, three-dimensional, metrology technique used to determine accurate surface roughness and topography measurements with subnanometer precision. The helical complex field (HCF) function is a topographically defined helix modulated by the electrical field reflectance, originally developed for the measurement of thin films. An approach to extend the capability of the HCF function to determine the spectral refractive index of a substrate or absorbing film has recently been proposed. In this paper, we confirm this new capability, demonstrating it on surfaces of silicon, gold, and a gold/palladium alloy using silica and zirconia oxide thin films. These refractive index dispersion measurements show good agreement with those obtained by spectroscopic ellipsometry.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.
Having issues? You can contact us here
Accelerating Research

Address

John Eccles House
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom