Network search method in the design of extreme ultraviolet lithographic objectives | Zendy

Oana Marinescu | Zendy; Florian Bociort | Zendy

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Network search method in the design of extreme ultraviolet lithographic objectives

Author(s) -

Oana Marinescu,

Florian Bociort

Publication year - 2007

Publication title -

applied optics

Language(s) - English

Resource type - Journals

ISSN - 0003-6935

DOI - 10.1364/ao.46.008385

Subject(s) - extreme ultraviolet lithography , extreme ultraviolet , optics , lithography , maxima and minima , figure of merit , computer science , free space optical communication , photomask , aperture (computer memory) , photolithography , physics , materials science , mathematics , resist , optical communication , nanotechnology , laser , mathematical analysis , layer (electronics) , acoustics

The merit function space of mirror system for extreme ultraviolet (EUV) lithography is studied. Local minima situated in the multidimensional optical merit function space are connected via links that contain saddle points and form a network. We present networks for EUV lithographic objective designs and discuss how these networks change when control parameters, such as aperture and field, are varied, and constraints are used to limit the variation domain of the variables. A good solution in a network, obtained with a limited number of variables, has been locally optimized with all variables to meet practical requirements.

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