Optimization of anisotropically etched silicon surface-relief gratings for substrate-mode optical interconnects | Zendy

Shun-Der Wu | Zendy; Thomas K. Gaylord | Zendy; Jonathan S. Maikisch | Zendy; Elias N. Glytsis | Zendy

AI Assistant Blog Pricing

Home ZAIA Blog

Open Access

Optimization of anisotropically etched silicon surface-relief gratings for substrate-mode optical interconnects

Author(s) -

Shun-Der Wu,

Thomas K. Gaylord,

Jonathan S. Maikisch,

Elias N. Glytsis

Publication year - 2006

Publication title -

applied optics

Language(s) - English

Resource type - Journals

ISSN - 0003-6935

DOI - 10.1364/ao.45.000015

Subject(s) - optics , materials science , grating , rigorous coupled wave analysis , diffraction efficiency , diffraction , silicon , diffraction grating , polarization (electrochemistry) , optoelectronics , substrate (aquarium) , physics , chemistry , oceanography , geology

The optimum profiles of right-angle-face anisotropically etched silicon surface-relief gratings illuminated at normal incidence for substrate-mode optical interconnects are determined for TE, TM, and random linear (RL) polarizations. A simulated annealing algorithm in conjunction with the rigorous coupled-wave analysis is used. The optimum diffraction efficiencies of the -1 forward-diffracted order are 37.3%, 67.1%, and 51.2% for TE-, TM-, and RL-polarization-optimized profiles, respectively. Also, the sensitivities to grating thickness, slant angle, and incident angle of the optimized profiles are presented.

The content you want is available to Zendy users.

Already have an account? Click here to sign in.

Having issues? You can contact us here

Accelerating Research