Photothermal deflection studies of GaAs epitaxial layers
Author(s) -
Nibu A. George,
C. P. G. Vallabhan,
V. P. N. Nampoori,
P. Radhakrishnan
Publication year - 2002
Publication title -
applied optics
Language(s) - English
Resource type - Journals
ISSN - 0003-6935
DOI - 10.1364/ao.41.005179
Subject(s) - materials science , photothermal therapy , epitaxy , deflection (physics) , thermal diffusivity , optics , photothermal spectroscopy , optoelectronics , impurity , molecular beam epitaxy , gallium arsenide , thin film , thermal , layer (electronics) , nanotechnology , chemistry , physics , organic chemistry , quantum mechanics , meteorology
Photothermal beam deflection studies were carried out with GaAs epitaxial double layers grown on semi-insulating GaAs substrates. The impurity densities in thin epitaxial layers were found to influence the effective thermal diffusivity of the entire structure.
Accelerating Research
Robert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom
Address
John Eccles HouseRobert Robinson Avenue,
Oxford Science Park, Oxford
OX4 4GP, United Kingdom