Model Surfaces Produced by Atomic Layer Deposition | Zendy

Rick B. Walsh | Zendy; Shaun C. Howard | Zendy; Andrew Nelson | Zendy; William Skinner | Zendy; Guangming Liu | Zendy; Vincent S. J. Craig | Zendy

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Model Surfaces Produced by Atomic Layer Deposition

Author(s) -

Rick B. Walsh,

Shaun C. Howard,

Andrew Nelson,

William Skinner,

Guangming Liu,

Vincent S. J. Craig

Publication year - 2012

Publication title -

chemistry letters

Language(s) - English

Resource type - Journals

SCImago Journal Rank - 0.492

H-Index - 114

eISSN - 1348-0715

pISSN - 0366-7022

DOI - 10.1246/cl.2012.1247

Subject(s) - chemistry , atomic layer deposition , layer (electronics) , deposition (geology) , nanotechnology , chemical engineering , organic chemistry , paleontology , materials science , sediment , engineering , biology

Atomic layer deposition is used with the aim of producing new model surfaces suitable for fundamental wet surface science investigations. Alumina surfaces are found to dissolve in aqueous solutions, although they can be passivated against dissolution by adsorption. Highly useful thick titania films can be produced by employing low temperatures during formation, whereas hafnia and zirconia films have a tendency to produce films that crystallize, and this increases the roughness of the films. © 2012, The Chemical Society of Japan

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