Open AccessDoubly Patternable Planarizing Lithography with AZ5214E Resist for Three Dimensional Processing
Author(s) -
Anssi Hovinen
Publication year - 2002
Publication title -
physica scripta
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.415
H-Index - 83
eISSN - 1402-4896
pISSN - 0031-8949
DOI - 10.1238/physica.topical.101a00181
Subject(s) - lithography , resist , materials science , layer (electronics) , photolithography , next generation lithography , transistor , extreme ultraviolet lithography , electron beam lithography , optoelectronics , nanotechnology , optics , physics , electrical engineering , engineering , voltage