Open AccessUsing Factorial Design and Response Surface Methodology to Optimize Growth Parameters of PECVD Grown Silicon Nitride
Author(s) -
K. Nybergh
Publication year - 1999
Publication title -
physica scripta
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.415
H-Index - 83
eISSN - 1402-4896
pISSN - 0031-8949
DOI - 10.1238/physica.topical.079a00266
Subject(s) - plasma enhanced chemical vapor deposition , silicon nitride , materials science , wafer , factorial experiment , annealing (glass) , silicon , linear regression , polynomial regression , nitride , optoelectronics , mathematics , statistics , composite material , layer (electronics)