Open AccessEffect of Oxidation Temperature on the Electrical Characteristics of Ultrathin Silicon Dioxide Layers Plasma Oxidized in Ultrahigh Vacuum
Author(s) -
T Majamaa,
O. Kilpelä
Publication year - 1999
Publication title -
physica scripta
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.415
H-Index - 83
eISSN - 1402-4896
pISSN - 0031-8949
DOI - 10.1238/physica.topical.079a00259
Subject(s) - plasma , materials science , silicon dioxide , silicon , optoelectronics , composite material , physics , quantum mechanics