Open AccessCharacterization of Wet Chemistry Resist and Resist Residues Removal Processes
Author(s) -
E. Muukkonen,
Teija H kkinen,
T. Riihisaari,
Simo Er nen,
Ismo Luusua,
Arto Kiviranta,
Pekka Savolahti
Publication year - 1999
Publication title -
physica scripta
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.415
H-Index - 83
eISSN - 1402-4896
pISSN - 0031-8949
DOI - 10.1238/physica.topical.079a00255
Subject(s) - resist , contamination , materials science , nanotechnology , residue (chemistry) , chemistry , analytical chemistry (journal) , environmental chemistry , organic chemistry , ecology , layer (electronics) , biology
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