Open AccessFabrication of SiO2/c-Si/SiO2 Double Barrier Structure Using Lateral Solid Phase Epitaxy
Author(s) -
С. В. Новиков,
J. Sinkkonen
Publication year - 1999
Publication title -
physica scripta
Language(s) - English
Resource type - Journals
SCImago Journal Rank - 0.415
H-Index - 83
eISSN - 1402-4896
pISSN - 0031-8949
DOI - 10.1238/physica.topical.079a00213
Subject(s) - materials science , epitaxy , silicon , fabrication , amorphous solid , amorphous silicon , optoelectronics , crystallography , nanotechnology , crystalline silicon , chemistry , layer (electronics) , medicine , alternative medicine , pathology